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Please use this identifier to cite or link to this item: http://hdl.handle.net/2307/335

Title: Ion beam assisted processes for Pt nanoelectrode fabrication onto 1-Dnanostructures
Authors: Notargiacomo, Andrea
Di Gaspare, Luciana
Evangelisti, Florestano
Keywords: Focused ion beam
Ion beam induced deposition
One-dimensional structures
Issue Date: Aug-2009
Publisher: Elsevier Science
Abstract: We present morphological and electrical characterizations of thin andnarrow resistors obtained by focused ion beam assisted deposition of Ptbased material.For thin and narrow depositions the measured thickness and width aresignificantly different from the nominal values. From leakage tests wefound that in order to have electrically insulated parallel resistorsat room temperature, it is mandatory that the Pt-halo, which resultsfrom the deposition procedure, has a thickness well below 6 nm. (C)200
URI: http://hdl.handle.net/2307/335
ISSN: 0749-6036
DOI: 10.1016/j.spmi.2008.11.013
Appears in Collections:A - Articolo su rivista
X_Dipartimento di Fisica 'Edoardo Amaldi'

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